SPIN COATING UNIT (PROGRAMMABLE):-
MAKE: HE (GMP/ISO 9001 – 2015/GMP/CE Certified )
Model: HSC – 9000
Technical Specification: -
• Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.
• 500 – 9000 RPM
• Accuracy<±0.5% of Full Speed
• Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 64 step
• Real time display of RPM, time and program stamps
• Nonvolatile program memory
• Input & control through soft touch key pad.
• Vacuum release switch
• Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch
(for glass substrate) & 20.0 sq. inch (for silicon wafers)
• Vacuum chuck: derlin made circular substrate holders of Dia 0.5”, 1”, 1.5”, 2.0” inch
• Microprocessor control A C brush less motor
• Acceleration 2000 rpm/sec (Maximum) use settable
• Calibration option.
• Vacuum Dial gauge.
• Frame: Epoxy coated MS.
• Facility for interlocking with Vacuum Pump.
• Tubing for Vacuum.
• Gas Purging Attachment for Nitrogen.
• Spill drainage facility
• To operate on 230V ± 10%, 1 phase 50 Hz AC only.
• Maximum Power 190W, Current 1.0 Amp.
Vacuum Pump: -
Make: HE (NSIC Regd, MSME Regd, ISO 9001 – 2015/14001-2015/13485-2016/FDA/ GMP/CE Certified)
Model Technical Name
HE115 N Flow rate 50 Hz
42 L/min
60 Hz 60 Hz
50 L/min
Ultimate vacuum Partial Pressure
Total Pressure Total Pressure
Power
Inlet Port
Model Technical Name
HE115 N Flow rate
Keywords
50 L
60 Hz
50 Hz
28 sq
4.0 sq
1 phase
20.0 sq
64 step
9000 RPM
1 program
MSME Regd
NSIC Regd
Full Speed
Vacuum Pump
Vacuum chuck
silicon wafers
program stamps
Substrate size
Current 1.0 Amp
glass substrate
size 6-inch dia
Epoxy coated MS
Acceleration 2000
Vacuum Dial gauge
Real time display
SPIN COATING UNIT
Calibration option
Maximum Power 190W
soft touch key pad
Total Pressure Power
A C brush less motor
Vacuum release switch
Microprocessor control
Gas Purging Attachment
Spill drainage facility
Technical Specification
interlock safety switch
Nonvolatile program memory
circular substrate holders
transparent photo resist lid
Polypropylene Working Chamber
time Preset editable programs
Ultimate vacuum Partial Pressure
Microprocessor Programmable Speed control
Inlet Port Model Technical Name HE115 N Flow rate
