Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch. 500 – 8000 RPM Accuracy<±0.5% of Full Speed Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 16 step Real time display of RPM, time and program stamps Nonvolatile program memory Input & control through soft touch key pad. Vacuum release switch Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch(for glass substrate) & 20.0 sq. inch (for silicon wafers)

Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch. 500 – 9999 RPM Accuracy<±0.5% of Full Speed Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 16 step Real time display of RPM, time and program stamps Nonvolatile program memory Input & control through soft touch key pad. Vacuum release switch Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch(for glass substrate) & 20.0 sq. inch (for silicon wafers)

Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch. 500 – 9500 RPM Accuracy<±0.5% of Full Speed Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 16 step Real time display of RPM, time and program stamps Nonvolatile program memory Input & control through soft touch key pad. Vacuum release switch Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch(for glass substrate) & 20.0 sq. inch (for silicon wafers)