
PROGRAMMABLE SPIN COATING UNIT:-
Make: HE (NSIC Regd, MSME Regd, ISO 9001 – 2015/14001-2015/13485-2016/FDA/ GMP/CE Certified)
Model: HSC – 9999
Introduction
Anti-corrosion spin coater adopts PP chamber (Optional PTFE chamber), which is beautiful and sturdy in appearance, has excellent chemical stability and strong corrosion resistance, and can be used in various occasions requiring acid and alkali resistance and organic solvents. Anti-corrosion spin coater adopts advanced precision motor; the maximum speed can reach 6000 RPM / 8000 RPM/ 9999 RPM, which effectively guarantees the uniformity of film formation. In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. It is very suitable for laboratory purchase.
Application:-
The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.
Technical Specification: -
Polypropylene Working Chamber (removable),
• size 6-inch dia, with transparent photo resist lid with interlock safety switch.
• 50 – 9999 RPM
• Accuracy<±0.5% of Full Speed
• Microprocessor Programmable Speed control with respect to time Preset editable programs of 8 program X 8 segments.
• Real time display of RPM, time and program stamps
• Nonvolatile program memory
• Input & control through soft touch key pad.
• Vacuum release switch
• Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch (For glass substrate) & 20.0 sq. inch (for silicon
wafers)
• Vacuum chuck: derlin made circular substrate
holders of Dia
• 0.5”, 1”, 1.5”, 2.0” inch
• Microprocessor control A C brush less motor.
• Acceleration 2000 rpm/sec (Maximum) use settable.
• Calibration option.
• Vacuum Dial gauge.
• Frame: Epoxy coated MS.
• Facility for interlocking with Vacuum Pump.
• Tubing for Vacuum.
• Gas Purging Attachment for Nitrogen.
• Spill drainage facility
• To operate on 230V ± 10%, 1 phase 50 Hz AC only.
• Maximum Power 190W, Current 1.0 Amp.
Specification:-
Working chamber Polypropylene working chamber
(6-inchdia)
RPM 50-9999 RPM with speed resolution 1 RPM
Accuracy ±1-0.5%
Memory USB/ Non-Volatile programmable
Vacuum release switch Yes
Substrate size 0.04 sq inch to 4.0 sq inch
Duration: 1 - 99 sec/min/hour for each step
Vacuum Chuk Derlin made 0.5”, 1”, 1.5”, 2”
Acceleration Preferable from 1000 to 2000 rpm/sec
Frame Epoxy coated MS
Operation voltage 230 V
Vacuum pump motor Oil free, ¼ HP max
Vacuum = 730 mm Hg
Others Gas purging attachment for Nitrogen
Warranty 2 years
Model Technical Name Technical Parameters
HE115 N Flow rate 50 Hz 1.8CFM
51 l/min
60 Hz 2.0CFM
57 l/min
Ultimate vacuum Partial Pressure 2 Pa
Total Pressure 150 micron
Power ¼ HP
Inlet Port ¼” Flare
Keywords
8 program
40 sq inch
rpm time
colloidal materials
coat liquid
spin coater
learning cost
greatly simplifies
coating curve
effectively guarantees
maximum speed
film formation
alkali resistance
polymer film production
strong corrosion resistance
technical parameters he115
gas purging attachment
vacuum pump tubing
form thin films
laboratory purchase application
occasions requiring acid
excellent chemical stability